en thermal modification unit operation (n) |
― IsA ⟶
Weight: 1.0
|
|
Source: OpenCyc 2012 | ||
en wafer depositions unit operation (n) |
― IsA ⟶
Weight: 1.0
|
|
Source: OpenCyc 2012 | ||
en wafer modifications unit operation (n) |
― IsA ⟶
Weight: 1.0
|
|
Source: OpenCyc 2012 | ||
en annealing unit operation (n) |
― IsA ⟶
Weight: 1.0
|
|
Source: OpenCyc 2012 | ||
en substrate preparations unit operation (n) |
― IsA ⟶
Weight: 1.0
|
|
Source: OpenCyc 2012 | ||
en epitaxy unit operation (n) |
― IsA ⟶
Weight: 1.0
|
|
Source: OpenCyc 2012 | ||
en wafer etching unit operation (n) |
― IsA ⟶
Weight: 1.0
|
|
Source: OpenCyc 2012 |