en thermal modification unit operation (n)
― IsA ⟶
Weight: 1.0
en unit operation (n) Source: OpenCyc 2012
en wafer depositions unit operation (n)
― IsA ⟶
Weight: 1.0
en unit operation (n) Source: OpenCyc 2012
en wafer modifications unit operation (n)
― IsA ⟶
Weight: 1.0
en unit operation (n) Source: OpenCyc 2012
en annealing unit operation (n)
― IsA ⟶
Weight: 1.0
en unit operation (n) Source: OpenCyc 2012
en substrate preparations unit operation (n)
― IsA ⟶
Weight: 1.0
en unit operation (n) Source: OpenCyc 2012
en epitaxy unit operation (n)
― IsA ⟶
Weight: 1.0
en unit operation (n) Source: OpenCyc 2012
en wafer etching unit operation (n)
― IsA ⟶
Weight: 1.0
en unit operation (n) Source: OpenCyc 2012