Edge list

Results from ConceptNet 5.8

Source: OpenCyc 2012
en 28 nm bulk sti (n)
― IsA ⟶
Weight: 1.0
en shallow trench isolation (n) Source: OpenCyc 2012
en 32 nm soi sti (n)
― IsA ⟶
Weight: 1.0
en shallow trench isolation (n) Source: OpenCyc 2012
en shallow trench isolation (n)
― IsA ⟶
Weight: 1.0
en semiconductor wafer processing single wafer (n) Source: OpenCyc 2012
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