Edge list

Results from ConceptNet 5.8

Source: OpenCyc 2012
en electrochemical deposition (n)
― IsA ⟶
Weight: 1.0
en industrial thin film electroplating (n) Source: OpenCyc 2012
en copper electroplating (n)
― IsA ⟶
Weight: 1.0
en electrochemical deposition (n) Source: OpenCyc 2012
en copper electroplating (n)
― IsA ⟶
Weight: 1.0
en electrochemical deposition (n) Source: OpenCyc 2012
en electrochemical deposition (n)
― IsA ⟶
Weight: 1.0
en wafer deposition (n) Source: OpenCyc 2012
en copper electroplating (n)
― IsA ⟶
Weight: 1.0
en electrochemical deposition (n) Source: OpenCyc 2012
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