en
photoresist exposure
(n)
|
― IsA ⟶
Weight: 1.0
|
en
semiconductor wafer processing
(n)
|
Source: OpenCyc 2012
|
en
semiconductor wafer processing
(n)
|
― IsA ⟶
Weight: 1.0
|
en
microfabrication
(n)
|
Source: OpenCyc 2012
|
en
wafer deposition
(n)
|
― IsA ⟶
Weight: 1.0
|
en
semiconductor wafer processing
(n)
|
Source: OpenCyc 2012
|
en
semiconductor wafer processing
(n)
|
― IsA ⟶
Weight: 1.0
|
en
processing
(n)
|
Source: OpenCyc 2012
|
en
photolithography semiconductor
(n)
|
― IsA ⟶
Weight: 1.0
|
en
semiconductor wafer processing
(n)
|
Source: OpenCyc 2012
|
en
lot processing step
(n)
|
― IsA ⟶
Weight: 1.0
|
en
semiconductor wafer processing
(n)
|
Source: OpenCyc 2012
|
en
modification
(n)
|
― IsA ⟶
Weight: 1.0
|
en
semiconductor wafer processing
(n)
|
Source: OpenCyc 2012
|
en
masking reticle projection
(n)
|
― IsA ⟶
Weight: 1.0
|
en
semiconductor wafer processing
(n)
|
Source: OpenCyc 2012
|
en
removal
(n)
|
― IsA ⟶
Weight: 1.0
|
en
semiconductor wafer processing
(n)
|
Source: OpenCyc 2012
|
en
semiconductor wafer processing
(n)
|
― IsA ⟶
Weight: 1.0
|
en
transformation process
(n)
|
Source: OpenCyc 2012
|